CAS No.: | 2628-16-2 |
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Formula: | C10h10o2 |
EINECS: | 434-600-2 |
Type: | Synthesis Material Intermediates |
Appearance: | Liquid |
Quality: | Industrial |
Samples: |
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Customization: |
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4-Acetoxystyrene
4Acetoxystyrene monomer is mainly used in the synthesis of polyhydroxystyrene. Polyhydroxystyrene is the main component fo photoresist which currently is the main body of the 248nm photoresist resin. 248nm photoresist is mainly used in the field of microelectronic chips and liquid crystal displays,with the wavelength of 248nmKrf laser for processing medium,widely used in the large-scale industrialization lithography production.
Product name
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4-Acetoxystyrene/4-Ethenylphenol acetate
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CAS No.
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2628-16-2
|
Molecular Formula
|
C10H10O2
|
Purity,%
|
99.0 min
|
Appreance
|
Colorless liquid
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Clarity
|
Clear
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Water,%
|
0.2max
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Polymer,%
|
0.5max
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